Deposition of Piezoelectric (aluminum nitride, doped AlN), Dielectric and Metal (molybdenum, tungsten, titanium and other materials) thin films

Our PVD System is based on cluster tool architecture which can be configured with multiple chambers, including pre-cleaning module, PVD modules, Ion Beam Trimming module and one or two Cassette (Loadlock) Modules. We supply the following configuration of PVD modules:

Dual Magnetron (AC/AC or AC/DC powered)
Single Magnetron (DC powered)

Features

Precise Laser Interferometer Thickness Control
Wafer rotation mechanism for uniform film properties, especially important for doped AlN films
Magnetic field adjustment for precise stress uniformity control
Dual Magnetron and high-density plasma configuration has been designed specifically for reactive processes and for improved film crystallinity on piezoelectric films
Substrate RF bias
A computer running standard Microsoft Windows software allows users to easily and intuitively operate the system.
System can be easily expanded to include a combination of Trimming and PVD modules as process requirements change.
The use of standardized modules and components minimizes the variety of spare parts required.